Paper presented at SPIE 2006 Download in Adobe Acrobat (PDF) Format
Abstract: Closed field” magnetron (CFM) sputtering offers a flexible and high throughput deposition process for optical coatings and thin films required in display technologies. CFM sputtering uses two or more different metal targets to deposit multilayers comprising a wide range of dielectrics, metals and conductive oxides. Moreover, CFM provides a room temperature deposition process with high ion current density, low bias voltage and reactive oxidation in the entire volume around the rotating substrate drum carrier, thereby producing films over a large surface area at high deposition rate with excellent and reproducible optical properties. Machines based on the Closed Field are scaleable to meet a range of batch and in-line size requirements. Typically, thin film thickness control to <±1% is accomplished simply using time, although optical monitoring can be used for more demanding applications. Fine layer thickness control and deposition of graded index layers is also assisted with a specially designed rotating shutter mechanism. This paper presents data on optical properties for CFM deposited optical coatings, including anti-reflection, IR blocker and colour control and thermal control filters, graded coatings, narrowband filters as well as conductive transparent oxides such as indium tin oxide. Benefits of the CFM sputter process are described.
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Paper presented at SVC 2006 Download in Adobe Acrobat (PDF) Format
Abstract: Magnetron Sputtering has many advantages over conventional evaporation processes for the deposition of transparent conducting oxides. The sputtering process is “cold”, making it suitable for use on the widest range of substrates including polymers. Moreover, the drum format provides more efficient loading for high throughput production. An additional advantage for deposition of transparent conductive oxides, such as indium tin oxide (ITO), is plasma driven oxidation of residual fractionated metal component thereby improving film conductivity. This also removes the need for post-annealing of films. In contrast to previous reactive dc sputtering strategies the Closed Field process does not require a separate ion or plasma source for activation. Neither does it require the vacuum chamber to be separated by vacuum pumps or baffles into deposition and reaction zones. Oxidation occurs on the target and all the way round the substrate carrier resulting in low absorption, no need for post annealing and reduced film electrical dependence on oxygen partial pressure. The use of the Closed Field and unbalanced magnetrons creates a magnetic confinement that extends the electron mean free path leading to high ion current densities. The combination of high current densities with ion energies in the range ~30eV creates optimum thin film growth conditions. As a result the films are dense, spectrally stable, super-smooth and with excellent optical/ electrical characteristics. This paper presents optical, electrical and surface metrology data for CFM sputtered ITO.
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Paper presented in 2005 Download in Adobe Acrobat (PDF) Format
Abstract: Characterisation of Super-Smooth Optical Coatings using White Light Interferometry.
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Paper presented at SVC 2005 Download in Adobe Acrobat (PDF) Format
Abstract: Magnetron sputtering has many advantages over conventional evaporation processes for the deposition of dielectric and electrically conducting thin films of metal oxides used in optical coatings. The sputtering process is "cold", making it suitable for use on the widest range of substrates, including polymers. The drum (or in-line) formats provide more efficient loading for high throughput production. The process is also easier to control and easier to maintain...
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Paper presented at OIC 2004 Download in Adobe Acrobat (PDF) Format
Abstract:
Closed field magnetron sputtering provides high ion current density and low bias voltage, enabling film deposition at high rate with excellent optical properties. Application to visible and near infra-red precision multilayer optical coatings is described.
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Paper presented at SVC 2004 Download in Adobe Acrobat (PDF) Format
Abstract: "Closed Field" magnetron (CFM) sputtering offers a flexible and high throughput deposition process for multilayer optical coatings. CFM uses two or more different metal targets to deposit multilayers comprising a wide range of dielectrics and/or metals/conductive oxides. Moreover, CFM provides high ion current density, low bias voltage and reactive oxidation in the entire volume around the rotating substrate drum carrier, thereby producing films over a large surface area at high deposition rate with excellent and reproducible optical properties. Machines based on the Closed Field are scaleable to meet a range of batch size requirements. Typically, thin film thickness control is accomplished simply using time although quartz crystal monitoring or optical monitoring can be used for more demanding applications. Fine layer thickness control and deposition of graded index layers is also assisted with a specially designed rotating shutter mechanism. This paper presents reproducibility data and optical properties for CFM deposited anti-reflection, UV/IR blocker and bandpass filters.
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Paper presented at SPIE Displays 2004 Download in Adobe Acrobat (PDF) Format
Abstract: "Closed field" magnetron (CFM) sputtering offers a flexible and high throughput deposition process for optical coatings and thin films required in display technologies. CFM sputtering uses two or more different metal targets to deposit multilayers comprising a wide range of dielectrics, metals and conductive oxides. Moreover, CFM provides a room temperature deposition process with high ion current density, low bias voltage and reactive oxidation in the entire volume around the rotating substrate drum carrier, thereby producing films over a large surface area at high deposition rate with excellent and reproducible optical properties. Machines based on the Closed Field are scaleable to meet a range of batch and in-line size requirements. Typically, thin film thickness control to <±1% is accomplished simply using time, although quartz crystal monitoring or optical monitoring are used for more demanding applications. Fine layer thickness control and deposition of graded index layers is also assisted with a specially designed rotating shutter mechanism. This paper presents data on optical properties for CFM deposited optical coatings relevant to displays, including anti-reflection, IR blocker and colour control and thermal control filters, graded coatings, barrier coatings as well as conductive transparent oxides such as indium tin oxide. Benefits of the CFM sputter process for a range of display technologies, OLED, EL and projection are described.
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