Products Overview
Applied Multilayers offers a step change improvement in capability for thin film coating processes and systems. The advantages of the CFM process include:
- The drum substrate carrier used in the CFM process is more efficient than the circular carrier used in evaporation. The substrate loading for the same sized vacuum chamber is about three times greater.
- The hardware used in the CFM process is simple compared with ion-assisted evaporation, increasing both reliability and ease of maintenance.
- The closed field process is a room temperature process ideal for plastic and glass substrates. Some evaporation processes on glass require substrate heating.
- The stability of the CFM process allows thin film thickness to be controlled using deposition time only for most applications.
- The thin films produced by the CFM process are of higher quality than those produced by e-beam evaporation. In particular, the films are denser, spectrally stable, super-smooth and more durable.
- Magnetron sputtering systems are more compact, more energy efficient and require less maintenance than electron beam evaporation systems.
Applied Multilayers offers a range of systems to match your application and budget. Systems can be provided with a turnkey process suitable for immediate coating production. We work with thin film researchers to push the technology and its applications even further. Applied Multilayers also provides sub-systems including linear magnetrons, hydrophobic stations etc.and targets and other consumables. Please take a look at our product pages and contact us if you have a special requirement.