Technical Papers
March 2010
Advanced systems for research into thin film PV
30 March 2009
Applied Multilayers offers a range of systems specially configured for research into thin film photovoltaics.
These systems range from affordable load locked systems for sputtering research with small circular six inch magnetron targets through to pilot scale batch systems for full module work with 1.2m magnetrons.
High-Throughput Optical Coating
01 August 2008
Sputtering processes for thin-film deposition are naturally enegetic and genrally do not require additional heat input to generate good morphology.
Download hereClosed field magnetron sputter deposition of carbide and nitrides for optical applications
17 April 2008
Magnetron Sputtering has many advantages over conventional evaporation processes for the deposition of carbides and nitrides for optical applications. The sputtering process is “cold”, making it suitable for use on the widest range of substrates including temperature sensitive substrates and polymers. Moreover, the drum format provide more efficient loading for high throughput production.
In contrast to previous reactive dc sputtering strategies the Closed Field process does not require a separate ion or plasma source for activation. Neither does it require the vacuum chamber to be separated by vacuum pumps or baffles into deposition and reaction zones. Reaction occurs on the target and all the way round the substrate carrier resulting in low absorption.
The use of the Closed Field and unbalanced magnetrons creates a magnetic confinement that extends the electron mean free path leading to high ion current densities. The combination of high current densities with ion energies in the range ~30eV creates optimum thin film growth conditions. As a result the films are dense, spectrally stable, supersmooth and low stress.
This paper presents optical, durability and stress data for CFM sputtered carbides and nitrides.
Nanometrology Project Produces Technology That Ada
01 August 2007
Magnetron sputtering produces super-smooth thin films and can be used for high-throughput production.
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